Far-Infrared/Submillimeter Astrophysics

Organization
National Aeronautics and Space Administration (NASA)
Reference Code
0060-NPP-NOV23-JPL-Astrophys
Application Deadline
11/1/2023 6:00:59 PM Eastern Time Zone
Description

Observations at far-infrared/submillimeter wavelengths play a critical role in our understanding of star formation and the life cycle of gas in the interstellar medium, and continued development of detectors and instruments is required to fully exploit this part of the spectrum. A postdoctoral fellow is sought to work with C. Darren Dowell and collaborators to work on the development of far-IR/submm instrumentation and on related astrophysics. Immediate opportunities include work on SOFIA instrumentation (HAWC+) and polarimetry of the interstellar medium, Kinetic Inductance Detectors for far-IR/submm wavelengths, and the Cerro Chajnator Atacama Telescope.

References:

A. Kovács, S. C. Chapman, C. D. Dowell, A. W. Blain, & T. G. Phillips, Astrophysical Journal, 650, 592 (2006) – “SHARC-2 350 Micron Observations of Distant Submillimeter Selected Galaxies”
P. K. Day, H. G. LeDuc, R. A. M. Lee, C. D. Dowell, & J. Zmuidzinas, in Proc. SPIE, 6275, #57 (2006) – “Distributed antenna-coupled transition edge sensors”



Location:
Jet Propulsion Laboratory
Pasadena, California

Field of Science:Astrophysics

Advisors:
Charles Darren Dowell
Charles.D.Dowell@jpl.nasa.gov
818 393-5032

Applications with citizens from Designated Countries will not be accepted at this time, unless they are Legal Permanent Residents of the United States. A complete list of Designated Countries can be found at: https://www.nasa.gov/oiir/export-control.

Eligibility is currently open to:

  • U.S. Citizens;
  • U.S. Lawful Permanent Residents (LPR);
  • Foreign Nationals eligible for an Exchange Visitor J-1 visa status; and,
  • Applicants for LPR, asylees, or refugees in the U.S. at the time of application with 1) a valid EAD card and 2) I-485 or I-589 forms in pending status
Eligibility Requirements
  • Degree: Doctoral Degree.
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